NexION 5000 Multi-Quadrupole ICP Mass Spectrometer | PerkinElmer
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NexION 5000 多重四极杆ICP-MS

NexION 5000是业界首款多重四极杆ICP-MS,由四组四极杆组成。其创新设计达到和超过如半导体、生物监测和其他应用领域严苛的痕量和超痕量元素检测要求。NexION 5000性能超越了传统的三重四极杆技术,提供极低的背景等效浓度(在高温热等离子字体中,BECs<1 ppt)和出色的检测极限,确保了结果的精度和可重现性。NexION 5000 ICP-MS具有:

  • 卓越的干扰消除能力
  • 出色的背景等效浓度(BECs)
  • 无与伦比的基体耐受性
  • 符合SEMI S2/S8法规和安规要求

货号
型号名称
技术类型
N8160010
NexION 5000 Cleanroom ICP-MS
Multi-Quad ICP-MS for Cleanroom Applications
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N8160009
NexION 5000 Non-Cleanroom ICP-MS
Multi-Quad ICP-MS for Non-Cleanroom Applications
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详细信息

The NexION 5000 Cleanroom ICP-MS is suitable for cleanroom applications, designed specifically for those requiring the highest level of cleanliness and the lowest background equivalent concentrations (<1 ppt, even in hot plasma). It is equipped with a host of new and proprietary technologies which together surpass traditional triple-quad capabilities and redefine your expectations:

  • Four quadrupoles:
    • First: Quadrupole Ion Deflector (Q0) directs ions to the entrance of the first mass filter
    • Second: Transmission Analyzer Quadrupole 1 (Q1, full-sized for <0.7 amu mass resolution), acts as a mass filter or as an ion guide to direct ions to the Quadrupole Universal Cell
    • Third: Quadrupole Universal Cell (Q2), empowered by dynamic bandpass tuning, prevents side reactions with residual reaction gases in the cell
    • Fourth: Transmission Analyzer Quadrupole 2 (Q3, full-sized for <0.7 amu mass resolution), acts as a mass filter or as an ion guide to direct ions to the detector
  • Extended Dynamic Range (EDR) increases linear dynamic range to 1014, allowing to run both high- and low-concentration analytes in a single analytical run, resulting in fewer re-runs
  • Low maintenance for greater uptime:
    • Triple Cone Interface with patent-pending OmniRing combined with Quadrupole Ion Deflector deliver no maintenance beyond cones, for continual operation and improved stability
    • 34 MHz free-running RF generator offers trouble-free user experience - the plasma is generated by the unique LumiCoil RF load coil, which is passively cooled by the extraction (does not require water or gas cooling), so maintenance-free, eliminating need to replace plasma load coils
  • External status lighting provides easy visibility of state of analysis, optimizing efficiencies
  • Syngistix for ICP-MS software (v. 3.0 or higher) brings together the power of the triple-quad ion optics with automated and user-friendly workflows and a contemporary user interface
  • Certified to be able to be upgraded to meet SEMI S2/S8 (emergency button) delivers ease of integration in cleanroom facilities

规格

深度 85.0 cm
高度 85.0 cm
型号名称 NexION 5000 Cleanroom ICP-MS
产品品牌名称 NexION
技术类型 Multi-Quad ICP-MS for Cleanroom Applications
重量 191.0 kg
宽度 114.0 cm
资源
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Ebook

棕榈油分析 — 从上游到下游的完整实验室解决方案

质量控制监控和测试是确保棕榈油质量的重要环节。质量控制参数用于判断棕榈油产品的质量,并可对其进行监控和测试,以确保棕榈油没有故意或意外掺假。

PDF 11 MB
NexION 5000 Multi-Quadrupole ICP-MS - Digest of Application Spotlights

Welcome to the application digest for PerkinElmer’s NexION® 5000 Multi-Quadrupole ICP-MS. The multi-award-winning NexION 5000 is the industry’s first and only four-quadrupole ICP-MS system, engineered to remove the most complex interferences and address the most challenging applications requiring ul ...

PDF 8 MB
New Developments in Multi-Quadrupole ICP-MS Technology for Challenging Applications

Laboratories conducting trace-elemental analyses require high-performance instrumentation capable of delivering accurate and reproducible results, even at low concentrations. Find out how recent developments in multi-quadrupole ICP-MS technology address these evolving needs. Advantages: superior int ...

PDF 3 MB

Infographic

网络研讨会

网络研讨会

产品手册

NexION 5000 化学高分辨多重四极杆ICP-MS 产品手册

在快节奏的分析界,为了保证质量和安全,检测结果的准确性和可重现性至关重要。业内的诸多使用者对检测设备有着共同的需求,期望在分析微量元素的同时可以去除干扰、提供非常低的检出限和出色的背景等效浓度 (BECs)。

这正是NexION® 5000背后的设计理念,为业内提供与众不同的化学高分辨多重四极杆ICP-MS。这个系统能够提供优于高分辨率ICP-MS和传统的三重四极杆技术。

领略NexION® 5000 ICP-MS的独特之处,欢迎下载相关资料。

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NexION 5000 Multi-Quadrupole ICP-MS - Interactive Brochure

In the fast-paced analytical world, accurate and reproducible results are essential to guaranteeing quality and ensuring safety. What many industries have in common is the need for trace-element analysis with superior interference removal, extremely low detection limits, and outstanding background e ...

PDF 2 MB
Analytical Sustainability Solutions

As the fundamental need to safeguard our environment continues to grow, and economic demand increases to support our growing population, it’s important to explore more sustainable avenues to ensure the long-term health of our planet at the same time as encouraging business and economic growth. Perki ...

PDF 2 MB
Comprehensive and Compliant Solutions for Glass Analysis

It’s clear, glass has a variety of uses, from practical to technological to decorative. In particular, float glass is widely used in architecture, automotive, transportation, photovoltaic, and solar industries. For glass testing labs around the world, we offer highly accurate and tailored solutions ...

PDF 2 MB
Automotive Materials Analysis Brochure

This brochure guides you through all our PerkinElmer analytical solutions for the automotive industry. From advanced polymers and rubber materials, to batteries, semiconductors, glass, fuels and lubricants. See how we can offer you fully-rounded laboratory solutions along the whole automotive value ...

PDF 2 MB

产品说明

Syngistix for ICP-MS Software - Revving Up the User Experience

Syngistix™ for ICP-MS software for the NexION® ICP-MS instruments is designed to improve efficiencies in the laboratory. It features a refreshed user interface that conforms to your workflow, delivering a modern, streamlined experience based on familiar left-to-right navigation and a ribbon menu, wi ...

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NexION 5000 Multi-Quadrupole ICP-MS

The NexION® 5000 is a multi-quadrupole-based ICP-MS instrument engineered to remove the most complex interferences, ideal for multi-element analysis applications requiring ultra-trace-level detection. Download this product note to discover all of its innovative features.

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单页

Power Up Your Battery Component Analysis Flyer

Download this useful flyer for a summary of how our instrumentation can test for safety, performance and composition of your advanced battery materials. Get an overview of solutions and their benefits in materials characterization techniques from FT-IR, ICP-OES, ICP-MS, DSC, TGA, GC-MS and hyphenate ...

PDF 523 KB

合规认证证书

Product Certificate - Nexion 5000

Product Certificate for the Nexion 5000

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应用文献

Analysis of Metallic Nanoparticles in Semiconductor-Grade Sulfuric Acid Using the NexION 5000 SP-ICP-MS

Fine and specialized chemicals are used throughout the manufacturing process of semiconductor and electronic products, requiring strict control of impurities. Among these impurities, contaminants of inorganic nature can adversely affect device performance and impact the yield of the fabrication proc ...

PDF 2 MB
Characterization of Ultrapure Water Using NexION 5000 ICP-MS

For decades, the semiconductor industry has been designing new devices that are smaller, faster and consume less power than their predecessors. To maintain this trend, the critical features of these devices must also become smaller and have fewer defects. The small diameter of a chip’s features requ ...

PDF 2 MB
Direct Analysis of Metallic Impurities in Hydrochloric Gas Using Gas Exchange Device (GED) ICP-MS

In today’s fast-paced world, semiconductors have become indispensable. Demands for faster and smaller chips with higher integration and lower energy consumption are increasing. Potential sources of metallic contamination in semiconductor manufacturing processes are ubiquitous, thus it is critical to ...

PDF 1 MB
Analysis of Metallic Impurities in Si Wafers Using Fully Automated VPD-ICP-MS

Silicon (Si) is the most used semiconductor and is a critical element for producing circuits found in everyday electronics. As more industries utilize semiconductor devices and Si wafers in electronic products and services, there is an increasing demand for Si wafers with minimal impurities due to t ...

PDF 1 MB
Analysis of Metallic Nanoparticles in Semiconductor Process Chemicals Using the NexION 5000 SP-ICP-MS

Metallic contamination in semiconductor products adversely affects device performance and impacts the yield of the fabrication process. To meet the demand for higher yields and performance in wafer substrates, contamination must be minimized on the wafer surface as well as in the substrate itself. T ...

PDF 1 MB
Analysis of High-Purity Silicon Matrices for Trace Contaminants with the NexION 5000 ICP-MS

The late 20th century to early 21st century has been described as the Silicon Age, because of the large impact that elemental silicon (Si) has had on the world economy. Highly purified Si used in semiconductor electronics is essential in the production of transistors and integrated circuit chips use ...

PDF 1 MB
Direct Determination of Trace Elements in Nickel-Based Superalloys with the NexION 5000 ICP-MS

Nickel-based superalloys are widely used in challenging environments because of their physical properties, which include, but are not limited to, toughness, high heat resistance, high strength-to-weight ratio, and low thermal conductivity. The required properties of state-of-the-art nickel-based sup ...

PDF 894 KB
Determination of Impurities in Electronic-Grade Hydrochloric Acid with the NexION 5000 ICP-MS

During the production of semiconductor devices, it is crucial to ensure that the silicon wafers are free of contaminants and impurities. The use of high-purity chemicals during the cleaning process is critical to the semiconductor product’s overall quality and performance. Therefore, it is essential ...

PDF 1 MB
Analysis of Phosphoric Acid Coupling the AutoSampler Dilution Module and Automated Standard Addition System with the NexION 5000 ICP-MS

Inductively coupled plasma mass spectrometry (ICP-MS) is an indispensable analytical tool in the semiconductor industry, since one of the most sensitive techniques for analyzing metallic impurities in chemicals. Most chemicals are analyzed with minimum dilution to determine ultra-trace levels of met ...

PDF 908 KB
Analysis of Semiconductor-Grade Hydrogen Peroxide Using the NexION 5000 ICP-MS

Contaminants in chemicals used during manufacturing processes have a direct impact on product yield and reliability of semiconductor devices. Within the whole process of integrated circuit manufacturing, wafers are sent for repeated cleaning using hydrogen peroxide (H2O2). Semiconductor Equipment an ...

PDF 1 MB
Ultra-Trace Elemental Analysis in High-Purity Sulfuric Acid

The production of electronic devices is a complex process that requires the use of ultra-pure chemicals during the manufacturing steps. High-purity-grade sulfuric acid (H2SO4) is generally used for cleaning components and etching all metal and organic impurities on silicon wafers. Impurities in sulf ...

PDF 1 MB
Analysis of Metallic Impurities in Organic Solvents Used in IC Fabrication with the NexION 5000 ICP-MS

The most commonly used organic chemicals in integrated circuit (IC) fabrication are isopropyl alcohol (IPA), propylene glycol methyl ether acetate (PGMEA), propylene glycol methyl ether (PGME), and n-methyl pyrrolidone (NMP). These solvents can leave behind organic film residues with metallic and no ...

PDF 1 MB

应用简报

NexION 5000 ICP-MS在血液分析中的应用

电感耦合等离子体质谱仪(ICP-MS)一直是分析尿液、血液、血清、唾液等体液以及各类组织中各种痕量元素(如铅Pb、砷As、汞Hg和铜Cu)的工具选择。随着骨科植入物的使用越来越多,钛(Ti)和钴(Co)等元素也被添加到常见测试分析物列表中。

在此,我们将展示出珀金埃尔默最新的化学高分辨多重四极杆ICP-MS仪器NexION 5000总结了血液分析的结果,以三种不同含量(正常、升高和较高)的血液标准物质ClinChek® 进行分析,展示了出色的准确性、稳定性和丰度灵敏度能力。

PDF 511 KB
NexION 5000 ICP-MS在超纯水分析中的应用

超纯水(UPW)被广泛地用于半导体器件生产中所有湿法工艺步骤,包括晶片冲洗和化学浴中化合物的稀释。在这些关键步骤中,可能会吸收来自化学浴和冲洗水中的污染物,然后通过一系列的化学和电化学反应沉淀到硅表面。在成品的重点区域中,如果金属污染物的浓度达到50 ppq,就会改变集成电路部件的电气参数,导致其无法通过最后的电气测试。因此超纯水纯度测定至关重要。 在此,我们将展示出珀金埃尔默最新的化学高分辨多重四极杆ICP-MS仪器NexION 5000获得的超纯水分析结果。NexION 5000 四组四极杆组成的多重四极杆ICP-MS质谱平台,通过各四极杆的不同质量分辨能力和工作模式,结合碰撞反应池技术, ...

PDF 679 KB
Rapid Ultra-Trace Analysis of Impurities in Ultrapure Water using the NexION 5000 ICP-MS

Since ultrapure water (UPW) is used throughout the semiconductor industry in a variety of applications, impurities need to be controlled as these will directly impact the quality and overall yield of semiconductor products. ICP-MS is often used to accurately quantify sub-ppt concentrations of impuri ...

PDF 1 MB
Automated Analysis of Semiconductor-Grade Sulfuric Acid with prepFAST S and NexION 5000 ICP-MS

Sulfuric acid (H2SO4) is used in the semiconductor industry to clean, etch impurities on silicon wafers and strip photoresist during the chip production processes. The reduction of potential contamination on silicon wafers is crucial, as trace-metal, particulate, and organic contaminants can alter t ...

PDF 1 MB
Automated Analysis of Semiconductor-Grade Nitric Acid with prepFAST S and NexION 5000 ICP-MS

Nitric acid (HNO3) is widely utilized in the semiconductor industry during the cleaning process of silicon wafers to reduce contamination by trace metals, particulates, and organic contaminants which would otherwise alter the functionality of the semiconductors. As such, the use of a high-quality ac ...

PDF 1 MB
Automated Analysis of Semiconductor-Grade Hydrofluoric Acid with prepFAST S and NexION 5000 ICP-MS

Hydrofluoric acid (HF) is widely utilized in the semiconductor industry during the cleaning process of silicon wafers in order to reduce contamination by trace metals, particulates, and organic contaminants which would otherwise alter the functionality of the semiconductors. As such, the use of high ...

PDF 1 MB
Automated Analysis of Semiconductor-Grade BOE with prepFAST S and NexION 5000 ICP-MS

Buffered oxide etchants (BOEs) are blends of hydrofluoric acid, ammonium fluoride, surfactants, and ultrapure water utilized in the semiconductor industry to etch thin films of silicon wafers. The reduction of potential contamination of silicon wafers during the etching process is crucial, as trace ...

PDF 1 MB
Ultra-Trace Quantification of Non-Metals in Sulfuric Acid Solutions using the NexION 5000 ICP-MS under Different Cell Gas Conditions

As semiconductor manufacturing processes are being performed at increasing micro-levels, the demand for ICP-MS instrumentation capable of analyzing non-metallic elements at ultra-trace concentrations has grown. For these applications, the use of an ICP-MS system with a full-length resolving quadrupo ...

PDF 1 MB
Ultra-Trace Determination of Non-Metallic Elements in Dilute Nitric Acid Using NexION 5000 ICP-MS

Nitric acid is widely used throughout the semiconductor and electronics industry. Various purity grades are required depending on the application and the intended use. For this reason, the semiconductor industry has required ever-lower detection of a broad range of impurities, including non-metallic ...

PDF 1 MB
Automated Analysis of Semiconductor-Grade TMAH with prepFAST S and NexION 5000 ICP-MS

Tetramethylammonium hydroxide (TMAH) is a basic solvent widely utilized in the semiconductor industry for photoresist development and lithography applications. The reduction of potential contamination on silicon wafers during the manufacturing processes is crucial as trace-metal, particulate and org ...

PDF 1 MB

技术说明

NexION 5000 ICP-MS新一代创新接口设计的优势

具有OmniRing的第二代三锥接口的新型设计专为NexION 5000 ICP-MS而研发,兼顾了灵敏度和稳定性。该设计以三锥接口几何 结构为基础,基于简单高效的OmniRing技术提供了独特的应对空 间电荷效应的解决方案。该设计从ICP-MS理想接口的诸多特性着 手,通过减少离子流提高了传输效率,与此同时,还以受控的方式 实现了离子通过接口后的加速,而不会将高能离子传输到下游离子 光学系统中。结果是在没有提高仪器本底水平的情况下,大大提高 了分析物的信号强度。通过这种新型接口设计,能够在强健等离子 体条件下,直接以亚ppt级的背景等效浓度对复杂基质进行分析。 除了提高灵敏度,该接口设计还使 ...

PDF 1 MB
ICP-MS 用于NexION ICP-MS的全基体进样系统(AMS)

在用珀金埃尔默NexION系列ICP-MS对高基体样品进行分析时,配合AMS系统可以给您 带来一系列好处。 通过将氩气通入雾室颈部,样品气溶胶得到稀释,可以获得更高的离子化效率、更小的基体效应和更少的锥口沉积,使样 品前处理更为简单,分析数据质量更高。

PDF 372 KB
Novel Interference Removal Opportunities with the NexION 5000 ICP-MS

The NexION® 5000 ICP-MS, with multi-quadrupole technology and Universal Cell, is able to take full advantage of element reactivity with 100% pure gases by analyzing them as cluster ions at higher masses where no interferences reside, and the background is clean. The Universal Cell, thanks to its qua ...

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Advantages of a Novel Plasma Generator for the NexION 1000/2200/5000 ICP-MS Systems

Unlike other ICP-MS systems on the market that utilize conventional 40-MHz or 27-MHz commercially available generators which are typically customized and modified to work with ICP-MS instruments, the NexION® 1000/2200/5000 ICP-MS systems feature a 34-MHz frequency free-running RF generator, which wa ...

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Interferences in ICP-MS: Do we still have to worry about them?

Interferences will always occur in ICP-MS and need to be dealt with. However, the NexION® 5000 multi-quadrupole ICP-MS with quadrupole Universal Cell is able to effectively and reproducibly remove spectral interferences leading to improved accuracy, repeatability and reproducibility, while solving p ...

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TotalQuant Analysis in NexION ICP Mass Spectrometers

TotalQuant, a software feature unique to PerkinElmer's NexION® ICP-MS systems, intelligently interprets the complete mass spectrum, providing semi-quantitative to quantitative results for all elements. TotalQuant and survey scan can provide supplementary and confirmatory information about unknown sa ...

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Novel Interface for NexION 2200/5000 ICP-MS Systems – Innovative Design, Uncompromised Performance

The innovative design of the second-generation Triple Cone Interface with patent-pending OmniRing™ was developed for the NexION® 2200 and 5000 ICP-MS systems with both sensitivity and stability in mind. It builds on the Triple Cone Interface geometry of the NexION series and provides unique solution ...

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指南

原子光谱将指导您选择合适的技术和系统

本指南概述了最常用的原子光谱技术,并提供了所需信息,能够帮助您选择最适合您个人需求的应用。

PDF 3 MB
NexION ICP-MS Series Consumables & Supplies Guide

Whether looking for sample introduction components or standards, we have the consumables you need to keep your NexION up and running smoothly and efficiently.

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Battery Analysis Guide

This guide offers an overview of analyses required throughout the battery value chain - learn about innovative analytical solutions for testing every part of the battery, including the anode, cathode, binder, separator, and electrolyte. See the value in data generated from a variety of applications ...

PDF 2 MB
NexION ICP-MS Series - Superior Interference Removal, Accurate Results

Accurate, reproducible trace elemental analysis is essential to ensuring the quality and safety of our products and our environment, and the award-winning NexION® ICP-MS platform delivers that level of accuracy and repeatability through a host of unique features that provide superior interference re ...

PDF 2 MB

文章

Sigma Analytical Services’ Journey as a Cannabis, Food, and Pharma Startup Laboratory

Newly regulated industries, such as cannabis, must deal with establishing standardized protocols with the prospect of regulations changing quickly and evolving as the industry expands. When establishing Sigma Analytical Services Inc. in 2017, a new company in a newly regulated industry with the inte ...

PDF 998 KB
Multi-Quadrupole ICP-MS – Pushing Limits of Detection to the Next Decimal

As the limits of detection (LODs) for trace metal analysis are increasingly being pushed to the next decimal, a need exists to meet these new detection requirements without compromising accuracy or precision. Inductively coupled plasma mass spectrometry (ICP-MS) is often the technique of choice for ...

PDF 1 MB

海报

Infographic - Solutions for your Toxicology Lab

Infographic Poster showing the range of different analytical solutions for Toxicology Labs; from GC and LC, to ICP-MS and UV-Vis. Benchtop and floor standing chromatography, spectroscopy and thermal solutions for everyday robust and reliable analyses. FOR RESEARCH USE ONLY. NOT FOR USE IN DIAGNOSTIC ...

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Advanced Solutions for Solar Cells Poster

Download this poster for an all-in-one view of how PerkinElmer instrumentation can answer the analytical needs of the solar market. From R&D of nanomaterials and advanced materials to solar cell component testing including aging and defect analysis - our UV/Vis, DSC, TGA, FT-IR and ICP systems help ...

PDF 1 MB

白皮书

Semiconductor Water Recycling: Analytical Action to Ensure Consistent Water Availability

As semiconductor science advances and the wafers become more complex - increasing volumes of water are needed for the production processes. Manufacturers must balance their water consumption with environmental factors and quality in production. This whitepaper examines the trends and innovations in ...

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