Inductively coupled plasma mass spectrometry (ICP-MS) is an indispensable analytical tool in the semiconductor industry, since one of the most sensitive techniques for analyzing metallic impurities in chemicals. Most chemicals are analyzed with minimum dilution to determine ultra-trace levels of metallic impurities. However, the sensitivity of ICP-MS is influenced by higher concentrations of chemicals, which occur in sample introduction, plasma, and ion lenses and cones.
This paper describes the results of phosphoric acid (H3PO4) analysis using the IAS Automated Standard Addition System (ASAS II_DS) and AutoSampler Dilution Module (ASDM) coupled to PerkinElmer’s NexION® 5000 Multi-Quadrupole ICP-MS.